Chemical Vapor Deposition Stocks List
Symbol | Grade | Name | % Change | |
---|---|---|---|---|
ASYS | F | Amtech Systems, Inc. | -2.66 | |
CVV | F | CVD Equipment Corporation | -1.31 | |
AEIS | D | Advanced Energy Industries, Inc. | -0.47 | |
LRCX | D | Lam Research Corporation | 1.79 | |
AMAT | C | Applied Materials, Inc. | 2.02 | |
ENTG | D | Entegris, Inc. | 2.67 | |
VECO | B | Veeco Instruments Inc. | 3.21 | |
NVMI | B | Nova Measuring Instruments Ltd. | 4.11 |
Related Industries: Diversified Industrials Electronic Components Semiconductor Equipment & Materials
Related ETFs - A few ETFs which own one or more of the above listed Chemical Vapor Deposition stocks.
Symbol | Grade | Name | Weight | |
---|---|---|---|---|
TINY | C | ProShares Nanotechnology ETF | 17.28 | |
PSI | C | PowerShares Dynamic Semiconductors | 14.96 | |
SEMI | C | Columbia Seligman Semiconductor and Technology ETF | 14.74 | |
FTXL | C | First Trust Nasdaq Semiconductor ETF | 14.25 | |
BULD | D | Pacer BlueStar Engineering the Future ETF | 10.91 |
Compare ETFs
- Chemical Vapor Deposition
Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.
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