Chemical Vapor Deposition Stocks List

Recent Signals

Date Stock Signal Type
2020-08-03 AEIS Shooting Star Candlestick Bearish
2020-08-03 AEIS Doji - Bearish? Reversal
2020-08-03 AEIS Lizard Bearish Bearish Day Trade Setup
2020-08-03 AEIS Stochastic Reached Overbought Strength
2020-08-03 AEIS Bollinger Band Squeeze Range Contraction
2020-08-03 AEIS Upper Bollinger Band Walk Strength
2020-08-03 AMAT NR7 Range Contraction
2020-08-03 AMAT Stochastic Reached Overbought Strength
2020-08-03 AMAT Bollinger Band Squeeze Range Contraction
2020-08-03 AMAT MACD Bullish Signal Line Cross Bullish
2020-08-03 ASYS Shooting Star Candlestick Bearish
2020-08-03 ASYS Lizard Bearish Bearish Day Trade Setup
2020-08-03 ASYS Stochastic Sell Signal Bearish
2020-08-03 CVV Crossed Above 50 DMA Bullish
2020-08-03 CVV NR7 Range Contraction
2020-08-03 CVV NR7-2 Range Contraction
2020-08-03 CVV Narrow Range Bar Range Contraction
2020-08-03 CVV Stochastic Buy Signal Bullish
2020-08-03 CVV Bollinger Band Squeeze Range Contraction
2020-08-03 ENTG New 52 Week High Strength
2020-08-03 ENTG New 52 Week Closing High Bullish
2020-08-03 LRCX New 52 Week High Strength
2020-08-03 LRCX NR7 Range Contraction
2020-08-03 LRCX Shooting Star Candlestick Bearish
2020-08-03 LRCX Doji - Bearish? Reversal
2020-08-03 LRCX New 52 Week Closing High Bullish
2020-08-03 LRCX Upper Bollinger Band Walk Strength
2020-08-03 NVMI New 52 Week High Strength
2020-08-03 NVMI New 52 Week Closing High Bullish
2020-08-03 NVMI Stochastic Reached Overbought Strength
2020-08-03 NVMI Upper Bollinger Band Walk Strength
2020-08-03 NVMI Pocket Pivot Bullish Swing Setup
2020-08-03 VECO 20 DMA Support Bullish
2020-08-03 VECO Wide Range Bar Range Expansion
2020-08-03 VECO Bollinger Band Squeeze Range Contraction
2020-08-03 VECO MACD Bullish Signal Line Cross Bullish
2020-08-03 VECO Pocket Pivot Bullish Swing Setup

Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.

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