Chemical Vapor Deposition Stocks List

Recent Signals

Date Stock Signal Type
2019-09-13 ASYS 50 DMA Resistance Bearish
2019-09-13 ASYS Crossed Above 200 DMA Bullish
2019-09-13 ASYS Stochastic Reached Overbought Strength
2019-09-13 ASYS Non-ADX 1,2,3,4 Bearish Bearish Swing Setup
2019-09-13 CVV 20 DMA Resistance Bearish
2019-09-13 CVV 50 DMA Resistance Bearish
2019-09-13 CVV Non-ADX 1,2,3,4 Bearish Bearish Swing Setup
2019-09-13 CVV Calm After Storm Range Contraction
2019-09-13 ENTG New 52 Week High Strength
2019-09-13 ENTG New 52 Week Closing High Bullish
2019-09-13 ENTG Upper Bollinger Band Walk Strength
2019-09-13 ENTG Pocket Pivot Bullish Swing Setup
2019-09-13 LRCX New 52 Week High Strength
2019-09-13 LRCX NR7 Range Contraction
2019-09-13 LRCX New 52 Week Closing High Bullish
2019-09-13 NVMI New 52 Week High Strength
2019-09-13 NVMI New 52 Week Closing High Bullish
2019-09-13 NVMI Upper Bollinger Band Walk Strength
2019-09-13 NVMI Slingshot Bullish Bullish Swing Setup
2019-09-13 VECO Doji - Bearish? Reversal

Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.

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