Chemical Vapor Deposition Stocks List

Recent Signals

Date Stock Signal Type
2019-11-12 AEIS Pocket Pivot Bullish Swing Setup
2019-11-12 AEIS Expansion Breakout Bullish Swing Setup
2019-11-12 AEIS New Uptrend Bullish
2019-11-12 AEIS New 52 Week Closing High Bullish
2019-11-12 AEIS Wide Range Bar Range Expansion
2019-11-12 AEIS Volume Surge Other
2019-11-12 AEIS New 52 Week High Strength
2019-11-12 ASYS Calm After Storm Range Contraction
2019-11-12 ASYS Lower Bollinger Band Walk Weakness
2019-11-12 ASYS 50 DMA Resistance Bearish
2019-11-12 CVV Fell Below 50 DMA Bearish
2019-11-12 CVV Fell Below 20 DMA Bearish
2019-11-12 ENTG Bollinger Band Squeeze Range Contraction
2019-11-12 ENTG 20 DMA Resistance Bearish
2019-11-12 NVMI Calm After Storm Range Contraction
2019-11-12 NVMI Upper Bollinger Band Walk Strength
2019-11-12 NVMI New 52 Week Closing High Bullish
2019-11-12 NVMI New 52 Week High Strength
2019-11-12 VECO Calm After Storm Range Contraction
2019-11-12 VECO Non-ADX 1,2,3,4 Bullish Bullish Swing Setup
2019-11-12 VECO 1,2,3 Pullback Bullish Bullish Swing Setup

Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.

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