Chemical Vapor Deposition Stocks List

Related ETFs - A few ETFs which own one or more of the above listed Chemical Vapor Deposition stocks.

Chemical Vapor Deposition Stocks Recent News

Date Stock Title
Nov 13 CVV Earnings Scheduled For November 13, 2024
Nov 12 AMAT What Wall Street Analysts Think of Applied Materials' Stock Ahead of Earnings
Nov 12 LRCX Lam Research Unusual Options Activity For November 12
Nov 12 AMAT Should AMAT Stock be Part of Your Portfolio Ahead of Q4 Earnings?
Nov 12 AMAT Potential semiconductor regulations place 50% of China WFE at risk: Bernstein
Nov 12 LRCX Potential semiconductor regulations place 50% of China WFE at risk: Bernstein
Nov 12 AMAT Is Now An Opportune Moment To Examine Applied Materials, Inc. (NASDAQ:AMAT)?
Nov 11 AMAT Chips mostly lower to start week ahead of key earnings; Monolithic Power slumps
Nov 11 AMAT Applied Materials Q4 Preview: Can Regulatory Headwinds Trump AI Catalysts?
Nov 11 AMAT Wall Street Bulls Look Optimistic About Applied Materials (AMAT): Should You Buy?
Nov 11 AMAT Applied Materials (AMAT) Q4 Earnings Preview: What You Should Know Beyond the Headline Estimates
Nov 11 VECO Veeco Instruments: Could Be On Hold For A While Going Into 2025
Nov 10 NVMI Nova Ltd (NVMI) Q3 2024 Earnings Call Highlights: Record Revenue Growth and Strategic Investments
Nov 10 AMAT Wall Street Week Ahead
Nov 9 VECO Earnings Beat: Veeco Instruments Inc. Just Beat Analyst Forecasts, And Analysts Have Been Updating Their Models
Nov 9 NVMI Nova Third Quarter 2024 Earnings: Beats Expectations
Nov 9 LRCX Lam Research Corporation's (NASDAQ:LRCX) large institutional owners must be happy as stock continues to impress, up 4.5% over the past week
Nov 8 LRCX ASML, others gets letter from lawmakers over China business
Nov 8 AMAT ASML, others gets letter from lawmakers over China business
Nov 8 AMAT Stocks to watch next week: Burberry, SSE, Disney, Alibaba and AstraZeneca
Chemical Vapor Deposition

Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.

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