Chemical Vapor Deposition Stocks List
|2019-08-19||AEIS||Non-ADX 1,2,3,4 Bearish||Bearish Swing Setup|
|2019-08-19||AEIS||Stochastic Buy Signal||Bullish|
|2019-08-19||ASYS||Pocket Pivot||Bullish Swing Setup|
|2019-08-19||ASYS||Lower Bollinger Band Walk||Weakness|
|2019-08-19||ASYS||Stochastic Buy Signal||Bullish|
|2019-08-19||CVV||Lower Bollinger Band Walk||Weakness|
|2019-08-19||CVV||Stochastic Buy Signal||Bullish|
|2019-08-19||CVV||New 52 Week Closing Low||Bearish|
|2019-08-19||CVV||New 52 Week Low||Weakness|
|2019-08-19||ENTG||20 DMA Support||Bullish|
|2019-08-19||VECO||Non-ADX 1,2,3,4 Bearish||Bearish Swing Setup|
Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high-performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.