Technical Analysis for CCMP - Cabot Microelectronics Corporation
Grade | Last Price | % Change | Price Change |
---|---|---|---|
B | 164.54 | 1.23% | 2.00 |
ADX | Long Term | Intermediate Term | Short Term |
---|---|---|---|
Weak or Absent | Up | Up | Down |
Historical CCMP trend table... |
Date | Alert Name | Type | % Chg |
---|---|---|---|
50 DMA Support | Bullish | 0.00% | |
Hammer Candlestick | Bullish | 0.00% | |
Non-ADX 1,2,3,4 Bullish | Bullish Swing Setup | 0.00% | |
Pocket Pivot | Bullish Swing Setup | 0.00% | |
Bollinger Band Squeeze | Range Contraction | 0.00% | |
Multiple of Ten Bullish | Other | 0.00% | |
BB Squeeze + Lower Band Touch | Range Contraction | 0.00% | |
Lower Bollinger Band Touch | Weakness | 0.00% | |
Fell Below 20 DMA | Bearish | 1.23% | |
50 DMA Support | Bullish | 1.23% |
Recent Intraday Alerts -- Get these alerts pushed to you via our Mobile App
Alert | Time | |
---|---|---|
Down 3% | 1 day ago | |
Fell Below Previous Day's Low | 1 day ago | |
Down 2 % | 1 day ago | |
60 Minute Opening Range Breakdown | 1 day ago | |
Fell Below 50 DMA | 1 day ago |
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- Earnings date: 02/03/2021
Cabot Microelectronics Corporation Description
Cabot Microelectronics Corporation engages in the development, manufacture, and sale of polishing slurries and pads used in the manufacture of advanced integrated circuit (IC) devices within the semiconductor industry in the United States, Asia, and Europe. The chemical mechanical planarization (CMP) technology is a polishing process used by IC device manufacturers to planarize or flatten the multiple layers of material that are deposited upon silicon wafers. The company offers CMP slurries, which are liquid solutions composed of high-purity deionized water, proprietary chemical additives, and engineered abrasives that chemically and mechanically interact with the surface material of the IC device at an atomic level; and CMP polishing pads that are engineered polymeric materials designed to distribute and transport the slurry to the surface of the wafer and distribute it evenly across the wafer. Its CMP slurries are used for various polishing applications, including materials that conduct electrical signals, such as tungsten, copper, tantalum, and aluminum; the dielectric insulating materials that separate conductive layers within logic and memory IC devices; and certain materials that are used in the production of rigid disks and magnetic heads for hard disk drives. The company also designs and produces precision polishing and metrology systems to attain shape and surface finish on various optical components, such as mirrors, lenses, and prisms. It serves producers of logic IC devices and memory IC devices, as well as IC foundries. Cabot Microelectronics Corporation was founded in 1999 and is headquartered in Aurora, Illinois.
Classification
Sector: Technology
Industry: Semiconductors
Keywords: Semiconductor Industrial Processes Semiconductor Device Fabrication Integrated Circuit Device Manufacturers Lenses Metrology Mirrors Abrasive Disk Drive Hard Disk Drive Polishing Abrasives Semiconductor Industry Chemical Mechanical Planarization Hard Disk Drives Chemical Mechanical Polishing Tungsten Dielectric Metrology Systems
Indicator | Bull Case | Neutral / Hold | Bear Case |
---|---|---|---|
50 DMA | |||
200 DMA | |||
ADX Trend | |||
Oversold / Overbought | |||
Relative Strength |
Indicator | Value |
---|---|
52 Week High | 179.27 |
52 Week Low | 85.26 |
Average Volume | 184,883 |
200-Day Moving Average | 151.61 |
50-Day Moving Average | 161.50 |
20-Day Moving Average | 169.68 |
10-Day Moving Average | 169.18 |
Average True Range | 8.11 |
ADX | 15.54 |
+DI | 17.51 |
-DI | 25.52 |
Chandelier Exit (Long, 3 ATRs ) | 154.93 |
Chandelier Exit (Short, 3 ATRs ) | 179.42 |
Upper Bollinger Band | 178.57 |
Lower Bollinger Band | 160.80 |
Percent B (%b) | 0.21 |
BandWidth | 10.47 |
MACD Line | 1.57 |
MACD Signal Line | 2.67 |
MACD Histogram | -1.0951 |
Pivot Point Level | Traditional / Classic | Fibonacci | Demark | Woodie | Camarilla |
---|---|---|---|---|---|
Resistance 4 (R4) | 181.43 | ||||
Resistance 3 (R3) | 180.58 | 174.09 | 178.62 | ||
Resistance 2 (R2) | 174.09 | 169.79 | 174.52 | 177.68 | |
Resistance 1 (R1) | 169.32 | 167.13 | 166.08 | 170.17 | 176.74 |
Pivot Point | 162.83 | 162.83 | 161.21 | 163.26 | 162.83 |
Support 1 (S1) | 158.06 | 158.53 | 154.82 | 158.91 | 152.34 |
Support 2 (S2) | 151.57 | 155.87 | 152.00 | 151.40 | |
Support 3 (S3) | 146.80 | 151.57 | 150.47 | ||
Support 4 (S4) | 147.65 |